Lightwind

Lightwind was started in 2001 with its first product, the L3, designed to provide critical chemical information about vacuum based semiconductor processes. The L3 uses a plasma source to ionize process gases and spectroscopy to identify and monitor them. One process critical application is A tomic L ayer D eposition where incomplete deposition of three or four Angstroms may mean device failure. Designed to operate with a continuous plasma the L3 has accumulated more than 400,000 mfg hours in ALD alone. Our second semiconductor spectroscopy solution was the S2. The S2 analyzes light given off during a process, and was created as a cost effective capability upgrade for most plasma etch systems in production. Through developing our technology and applications Lightwind has been awarded multiple patents in the United States as well as throughout the world. July 2009 Lightwind became a distributor for Ocean Optics products on the West Coast. With that relationship Lightwind has been able to apply its automation and control expertise in other important areas where spectroscopy can be used to provide solutions which incorporate monitoring, detection, measurement or control of manufacturing processes.