D2S

D2S | D2S is an emerging company providing a computational design platform to maximize existing e-beam technology to reduce mask costs for both low and high volume applications. D2S design-for-e-beam (DFEB) mask technology reduces mask write times for high-volume designs with complex and circular features using existing e-beam mask writing equipment. D2S DFEB direct write technology virtually eliminates the costs of masks for low-volume applications and can speed time-to-market by shortening the design-to-lithography process flow. History | The D2S technology has been in development since 2002 by an experienced and successful EDA team. It is backed by Benchmark Capital, DAG Ventures and strategic corporate partners. In 2009, D2S created the eBeam Initiative as a forum for DFEB education and promotion across the semiconductor ecosystem.